发明名称 |
VAPOR GENERATOR AND SUBSTRATE DRYING EQUIPMENT EQUIPPED WITH SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a vapor generator which can prevent smearing of a substrate and oversupply of solvent vapor by contriving the shape of a container. SOLUTION: Since a container 63 has a section 69 interconnecting a reservoir section 65 and a retention section 67 with a channel cross-sectional area smaller than the transverse area of the reservoir section 65 and the retention section 67, evaporation area can be reduced when isopropyl alcohol stored in the reservoir section 65 is heated by means of a heater 43 and evaporated. Even if isopropyl alcohol bumps, scattering area of mist is small and smearing of a substrate W due to bumping can be prevented. Furthermore, oversupply of vapor from a supply port 79 can be suppressed because the evaporation area of isopropyl alcohol is small and generation of vapor can be suppressed. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2008078191(A) |
申请公布日期 |
2008.04.03 |
申请号 |
JP20060252652 |
申请日期 |
2006.09.19 |
申请人 |
DAINIPPON SCREEN MFG CO LTD |
发明人 |
AIHARA TOMOAKI;HONJO ICHIHIRO |
分类号 |
H01L21/304;F26B5/04;F26B21/14;F26B23/06 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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