| 摘要 |
A plasma processing apparatus is provided to adjust a capacitive coupling plasma effect between a reaction gas and a coil in a process chamber by rotating a first Faraday shield and/or a second Faraday shield. A plasma process is performed in a process chamber(200) having a sidewall(210) made of dielectric. A plasma generator has a coil(310) disposed to enclose a side of the process, and an RF power applying member applying an RF power to the coil, thereby generating the plasma in the process chamber. Faraday shields(400,500) are disposed in parallel between the sidewall of the process chamber and the coil, and at least one slits(410,510) are formed on the Faraday shields, respectively.
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