发明名称 TRANSFER FILM FOR PREPARING AN ELECTRON EMISSION SOURCE, PREPARING METHOD OF AN ELECTRON EMISSION SOURCE USING THE FILM AND ELECTRON EMISSION SOURCE PREPARED BY THE METHOD
摘要 A transfer film for forming an electron emission source, an electron emission source forming method using the same, and the electron emission source produced by the same are provided to control the shape, uniformity, and height of a tip of the electron emission source easily by adjusting the thickness of the transferred film and to exclude a screen printing process. A transfer film for forming an electron emission source is composed of: a support(11); an alkali-soluble thermoplastic resin layer(12) formed on the support; and a photosensitive resin layer(13) formed on the thermoplastic resin layer, wherein the photosensitive resin layer contains carbon materials. The carbon material includes at least one of a CNT(Carbon Nano-Tube), carbon nano-fiber, and carbon nano-horn. The photosensitive resin layer is made of a photosensitive composition. The photosensitive composition consists of alkali-soluble resin of 5~60wt.%, photopolymerization monomer of 1~50wt.%, a photoinitiator of 0.1~20wt.%, carbon material of 0.1~10wt.%, and the residual solvent.
申请公布号 KR100818506(B1) 申请公布日期 2008.03.31
申请号 KR20060132637 申请日期 2006.12.22
申请人 CHEIL INDUSTRIES INC. 发明人 KIM, TAE JOONG;OH, JAE HWAN;CHO, JAE HWI
分类号 B32B27/16;B32B27/18;H01J9/02 主分类号 B32B27/16
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