ETCHING APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICES AND METHOD OF MAINTAINING THE SAME

摘要

An etching apparatus for use in fabrication of a semiconductor device and a maintenance method thereof are provided to enhance a manufacturing yield and process reliability by preventing contamination of a reaction chamber due to a maintenance operation. A drain pipe(120) is connected to a reaction chamber(110) to discharge by-products generated from etching reaction. The drain pipe is supplied with vapor from a vapor supply pipe(130). A vapor control valve(140) is connected to the vapor supply pipe to regulate the supply of the vapor. A power generator is positioned on the upper portion of the reaction chamber, and a gate valve(160) is positioned between the reaction chamber and the drain pipe. A drain pump(170) is placed on the drain pipe.