MASK BLANKS SELECTION METHOD, CALCULATION METHOD FOR BIREFRINGENCE INDEX, LITHOGRAPHIC METHOD, MASK BLANKS SELECTING DEVICE, BIREFRINGENCE INDEX CALCULATION DEVICE AND PROGRAM THEREFOR

摘要

PROBLEM TO BE SOLVED: To suppress dimensional fluctuation of a transfer pattern within an allowable range and to improve the yield of products and the throughput.

SOLUTION: A birefringence index calculation device 11 calculates distribution of RBI as an index representing changes in the polarization state between incident light entering a photomask and exiting light exiting from the photomask, originating from the incident light. Then a selection device 21 selects a mask blanks based on the distribution of the calculated RBI and on the allowable value of dimensional fluctuation in a pattern transferred onto a photoresist film formed on a wafer.

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