发明名称 GRINDING PAD AND METHOD OF MANUFACTURING THE SAME
摘要 <P>PROBLEM TO BE SOLVED: To provide a grinding pad which prevents abrasive grains and grinding chips from clogging the interior of each bubble and a groove, and is hardly decreased in grinding speed even after long-time continuous use, and also to provide a method of manufacturing a semiconductor device using the grinding pad. <P>SOLUTION: The grinding pad 1 has a grinding layer formed of a polyurethane resin foam which contains 0.01 to 25 wt.% of particulates formed of a polyurethane resin and having a mean particle size of 0.1 to 100 &mu;m. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008068333(A) 申请公布日期 2008.03.27
申请号 JP20060247007 申请日期 2006.09.12
申请人 TOYO TIRE & RUBBER CO LTD 发明人 DOURA MASATO;HIROSE JUNJI
分类号 B24B37/20;B24B37/24;B29B17/00;B29B17/04;C08G18/65;C08G101/00;H01L21/304 主分类号 B24B37/20
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