发明名称 |
METHOD OF MANUFACTURING ORGANIC SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To restore semiconductor characteristics deteriorated in a process after a patterned organic semiconductor layer is formed in an organic semiconductor device having the organic semiconductor layer. SOLUTION: When an electron device is manufactured using an organic semiconductor, a restoring process of semiconductor characteristics is performed to restore the semiconductor characteristics of the organic semiconductor by bringing the deteriorated organic semiconductor into contact with a solvent. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2008072041(A) |
申请公布日期 |
2008.03.27 |
申请号 |
JP20060251144 |
申请日期 |
2006.09.15 |
申请人 |
MITSUBISHI CHEMICALS CORP |
发明人 |
ARAMAKI SHINJI;ONO REI;SAKAI YOSHIMASA |
分类号 |
H01L29/786;H01L21/3065;H01L51/05;H01L51/40 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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