发明名称 METHOD OF MANUFACTURING ORGANIC SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To restore semiconductor characteristics deteriorated in a process after a patterned organic semiconductor layer is formed in an organic semiconductor device having the organic semiconductor layer. SOLUTION: When an electron device is manufactured using an organic semiconductor, a restoring process of semiconductor characteristics is performed to restore the semiconductor characteristics of the organic semiconductor by bringing the deteriorated organic semiconductor into contact with a solvent. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008072041(A) 申请公布日期 2008.03.27
申请号 JP20060251144 申请日期 2006.09.15
申请人 MITSUBISHI CHEMICALS CORP 发明人 ARAMAKI SHINJI;ONO REI;SAKAI YOSHIMASA
分类号 H01L29/786;H01L21/3065;H01L51/05;H01L51/40 主分类号 H01L29/786
代理机构 代理人
主权项
地址