| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve a defect detecting accuracy in defect detection on a semiconductor circuit pattern, by easily setting an optimal difference image filter. <P>SOLUTION: In a defective testing method for semiconductor wafers, a difference image obtained from a detection image as an testing object and a reference image for comparison is subjected to filter processing. This filter processing is performed by displaying and referring information about a gray level for each difference image before and after filter processing. As gray level information, a gray level for the difference image before and after filter processing and histogram in relation to the number of pixels are included. As for a defect detection device, a detected image, a reference image, a difference image, a difference image after filter processing, and histogram for each difference image before and after filter processing are displayed. The histogram is renewed and displayed whenever the filter is set. <P>COPYRIGHT: (C)2008,JPO&INPIT |
