Method of forming image contour for predicting semiconductor device pattern

摘要

A method of forming an image contour for predicting a pattern image formed on a wafer from a layout of a semiconductor device includes: forming a basic layout for a semiconductor device; performing an optical proximity effect correction (OPC) on the basic layout to form an OPC layout; defining nonlinear regions and linear regions of the basic layout; emulating the nonlinear regions of the basic layout using the OPC layout to form an image contour of the nonlinear regions; determining the linear regions of the basic layout as an image contour of the linear regions; and combining the image contour of the nonlinear regions and image contour of the linear regions to form an image contour of the entire semiconductor device.