| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an illumination optical system which forms a necessary light source in high efficiency while suppressing a change of either of an opening angle and a ratio of internal diameter to external diameter of a light source distribution region without dropping illumination efficiency and changing the other and which can improve the producibility of a semiconductor device, to provide an exposure apparatus provided with the illumination optical system, and to provide a method of manufatcuring a device by using the exposure apparatus. <P>SOLUTION: The illumination optical system is comprised of a first group that includes a rod integrator 1, a prism group 2, a zoom lens 5, a fly-eye integrator 6, a condenser lens 7, a masking image formation lens 8, an original plate 9, a projection optical system 10, a substrate 11, and a diaphragm 12, wherein the prism group 2 is provided with a conical concave refraction face 3a and a pyramid concave refraction face 4a, and a second group that is provided with a conical convex refraction face 3b and a pyramid convex refraction face 4b. The exposure system is provided with the illumination optical system, and the method of manufacturing a device uses the exposure apparatus. <P>COPYRIGHT: (C)2008,JPO&INPIT |
