METAL ALKOXIDE COMPOUND, FILM-FORMING RAW MATERIAL AND PROCESS FOR PREPARING FILM

摘要

PROBLEM TO BE SOLVED: To impart the properties such as decomposition properties by heat and/or oxidation, heat stability, vapor pressure and the like conforming as the film-forming raw material, particularly a CVD raw material to a precursor for supplying titanium, zirconium or hafnium to a film in the process for preparing the film which has a vaporization step. SOLUTION: The metal alkoxide compound is represented by formula (1) (wherein R1to R8are each hydrogen or a methyl group and M is titanium, zirconium or hafnium). COPYRIGHT: (C)2008,JPO&INPIT