发明名称 |
SYNTHESIS APPARATUS AND METHOD FOR METAL COMPOUND STANDARD MIXTURE GAS AND PRETREATMENT METHOD OF METAL COMPOUND STANDARD MIXTURE GAS |
摘要 |
A metal compound standard mixture gas producing apparatus and a method, and a metal compound standard mixture gas analysis and pretreatment method are provided to present a standard for analysis of metal impurities and metal harmful matter of the special gas by exactly analyzing the metal impurities or restricted materials. A metal compound standard mixture gas producing apparatus is composed of: a primary background gas supply source(10); a carrier gas supply source(11); two mass flow controllers(30,40) controlling the flow of the background gas and carrier gas supply fed from the primary background gas supply source and the carrier gas supply source; an evaporator(50) connected to the carrier gas mass flow controller to evaporate and dilute MOCVD(Metal Organic Chemical Vapor Deposition) and to make the diluted MOCVD flow; a mixer(60) connected to the primary background gas mass flow controller and the evaporator, respectively to mix the inflow background gas and MOCVD; a secondary background gas supply source(12); a buffer container(2) containing the secondary background gas flowing through the secondary background gas supply source and the mixture gas flowing through the mixer; a mixture gas container connected to the buffer container to receive the gas flowing from the buffer container; and a precise balance(130) connected to the mixture gas container to measure the weight of the background gas.
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申请公布号 |
KR100816818(B1) |
申请公布日期 |
2008.03.26 |
申请号 |
KR20070004918 |
申请日期 |
2007.01.16 |
申请人 |
DAESUNG INDUSTRIAL GASES CO., LTD. |
发明人 |
MOON, HUNG MAN;JUNG, WOO CHAN;LEE, SONG HO;KIM, JUNG WON;LEE, CHANG SUP |
分类号 |
B01L5/00;B01F3/02;G01N30/04;G01N33/00 |
主分类号 |
B01L5/00 |
代理机构 |
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代理人 |
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主权项 |
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