| 摘要 |
<p>Low oxygen content alloy compositions comprising Fe and Pt, and a sputtering target comprising the low oxygen content alloy compositions are provided to develop thin film materials having particular magnetic properties as well as high purity since the presence of impurities such as oxygen can produce short diffusion paths into the magnetic layers through the thin film materials. An alloy composition comprises 84 to 65 at.% of Fe and 16 to 35 at.% of Pt, and contains 500 ppm or less of O and 100 ppm or less of S. The alloy composition comprises 84 to 67 at.% of Fe and 16 to 33 at.% of Pt. The alloy composition contains 100 ppm or less of O and 50 ppm or less of S. An alloy composition comprises 65 to 41 at.% of Fe and 35 to 59 at.% of Pt, and contains 500 ppm or less of O and 100 ppm or less of S. The alloy composition comprises 65 to 45 at.% of Fe and 35 to 55 at.% of Pt. The alloy composition contains 100 ppm or less of O and 50 ppm or less of S. An alloy composition comprises 43 to 17 at.% of Fe and 57 to 83 at.% of Pt, and contains 500 ppm or less of O and 100 ppm or less of S. The alloy composition comprises 43 to 21 at.% of Fe and 57 to 79 at.% of Pt. The alloy composition contains 100 ppm or less of O and 50 ppm or less of S.</p> |
