| 摘要 |
A focus ring and a plasma processing apparatus are provided to effectively focus plasma at an upper space of a semiconductor wafer mounted on a mounting base by using the focus ring. A focus ring includes first and second ring type members(5a,5b). The first ring type member, which is made of conductive materials, includes an end part, which is implemented lower than a bottom of an objective substrate mounted on a mounting base(2) and extended to a lower portion of the objective substrate, at an edge of an inner portion thereof. The second ring type member, which is made of insulating materials, is disposed at a lower portion of the first ring type member.
|
