| 摘要 |
A position apparatus is provided to stably position the notch on a wafer by preventing a wafer from being damaged by friction of the lateral surface of the wafer and a structure for detecting the notch of a wafer until every notch of around fifty wafers is placed. An inner receiving space is formed in a frame(F) including a wafer guide part composed of a plurality of grooves that corresponds to the shape of both sides of the upper surface of the frame so that a wafer(W) is inserted into the grooves so as to be guided. A wafer rotating unit(10) is installed in the frame, supporting the outer circumference of the wafer and rotating the wafer clockwise and counterclockwise. A notch detection unit(20) detects and aligns the notch of the wafer rotated by the wafer rotating unit, installed in the frame in a manner that is disposed at one side of the wafer rotating unit. An align checking unit(30) checks whether the alignment of the notch detected by the notch detecting unit is completed, installed in the frame in a manner that is deposited at one side of the notch detecting unit. The wafer rotating unit can include a driving motor(M), a driving roller(12) and a sub roller(14). The driving motor receives power from an external power source to generate rotation force. The driving roller rotates by being coupled to the driving motor by a gearing apparatus. The sub roller is disposed in parallel with the driving roller, rotating by being coupled to the driving roller by a gearing apparatus.
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