| 摘要 |
PROBLEM TO BE SOLVED: To provide a cleaning device and a method for efficiently separating and removing foreign matters isolated from an object to be cleaned from a circulation flow without increasing a pressure loss of the circulation flow or affecting the flow velocity of the circulation flow as much as possible. SOLUTION: In the cleaning device 100, a semiconductor wafer 7 stored in a wafer carrier 6 is immersed in a cleaning liquid 3 circulating in a cleaning tank 102 and forming a circulation path to clean the wafer. The cleaning tank 102 is provided with a branching part 103 forming a branching path following the flow direction of the circulation flow and directed toward an external part. COPYRIGHT: (C)2008,JPO&INPIT
|
