A method of making a patterned layer comprises directing a beam of vaporized material toward a reflector such that the beam of vaporized material impinges an impingement surface of the reflector and is redirected from the reflector through one or more apertures in a shadow mask and onto a deposition substrate to form a patterned material layer.
申请公布号
WO2007021544(A3)
申请公布日期
2008.03.13
申请号
WO2006US30067
申请日期
2006.08.02
申请人
3M INNOVATIVE PROPERTIES COMPANY
发明人
HAASE, MICHAEL A.;BAUDE, PAUL, F.;HEMMESCH, ERIC, W.