| 摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method of a transparent conductive film excellent in transparency and conductivity and capable of suppressing degradation with time of a surface resistance value, as well as a transparent conductive film. SOLUTION: The manufacturing method of the transparent conductive film comprises a reduction process of reducing a coating film mainly composed of an indium compound coated on a base material at a temperature of 200°C or more under reduction atmosphere and obtaining a coating film with coating components mainly composed of indium metal fused with each other, and an oxidation process of obtaining a transparent conductive coating mainly composed of indium oxide by oxidizing the coating obtained under oxidizing atmosphere containing oxygen and/or ozone. A deoxidation treatment may be carried out after the oxidation process. Thus, a transparent conductive film with excellent transparency and conductivity as well as with little degradation with time of a surface resistance value is obtained. COPYRIGHT: (C)2008,JPO&INPIT
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