发明名称 Defect inspection apparatus
摘要 A controller determines, in response to a position coordinate from an X/Y interferometer, which algorism should be used for current inspection, and controls a connection status of a switch to store a reference image corresponding thereto in an image memory. The reference image is one of an image of a sample surface obtained by an image data acquisition unit, an image provided from a cell reference image generation unit, and an image provided from a CAD data reference image generation unit. The controller further controls a connection status of a second switch to provide the reference image associated with the current inspection algorism to an image comparator, where the provided reference image is compared with a currently obtained image. On the basis of a result of the comparison, a defect determination unit determines the presence/absence of a defect. Therefore, an utilization efficiency of a defect inspection apparatus which is capable of performing a plurality of defect inspection algorism, can be improved.
申请公布号 US2008063258(A1) 申请公布日期 2008.03.13
申请号 US20070979143 申请日期 2007.10.31
申请人 EBARA CORPORATION 发明人 KIMBA TOSHIFUMI
分类号 G06K9/00;G01N21/956;G03F7/20;G21K7/00 主分类号 G06K9/00
代理机构 代理人
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