发明名称 RADIATION-SENSITIVE COMPOSITION FOR COLORED LAYER FORMATION AND COLOR FILTER
摘要 <P>PROBLEM TO BE SOLVED: To make a dried product of a radiation-sensitive composition for colored layer formation generated at a slit nozzle highly solvent-resoluble and to prevent generation of a bumping hole. <P>SOLUTION: A radiation-sensitive composition for colored layer formation is provided comprising (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer, (D) a photoradical generator and (E) a solvent, wherein the photoradical generator (D) comprises a compound typified by ethanone, 1-ä9-ethyl-6-[2-methyl-4-(2,2-dimethyl-1,3-dioxolanyl)methoxybenzoyl]-9.H.-carbazol-3-yl}-,1-(o-acetyloxime) and the solvent (E) comprises 5-40 wt.% of dipropylene glycol dimethyl ether. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008058551(A) 申请公布日期 2008.03.13
申请号 JP20060234740 申请日期 2006.08.31
申请人 JSR CORP 发明人 HATTORI TATSUYA;KAWAMOTO TATSUYOSHI;ARAI MASAFUMI;KOBAYASHI KAZUHIRO;MAKIHIRA ISAMU
分类号 G03F7/028;C08F2/46;G02B5/20;G03F7/004;G03F7/027;G03F7/40 主分类号 G03F7/028
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