| 摘要 |
PROBLEM TO BE SOLVED: To provide a film-forming apparatus which can inhibit a defective product from being formed in a buffer chamber even when abnormality occurs in a film-forming chamber, by stocking a substrate temporarily in the buffer chamber until a film-forming chamber is recovered. SOLUTION: The film-forming apparatus is directed at coating a substrate which moves from an upstream side to a downstream side with a film-forming material, and comprises: the first film-forming chamber which makes the substrate coated with the film-forming material therein; the buffer chamber which is placed in the downstream side of the first film-forming chamber in a moving direction for the substrate, and can temporarily stop the transportation of the substrate toward the downstream side by stocking the substrate transported from the first film-forming chamber; and the second film-forming chamber which is placed in the downstream side of the buffer chamber in a moving direction for the substrate, and makes the transported substrate coated with the film-forming material therein. COPYRIGHT: (C)2008,JPO&INPIT
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