发明名称 METHODS OF FABRICATING SUBSTRATES INCLUDING AT LEAST ONE CONDUCTIVE VIA
摘要 A method of fabricating a substrate is disclosed. Apertures are formed in a substrate blank. A conductive layer is formed on opposing surfaces of the substrate, as well as inside the apertures. Conductive elements are defined on one or both opposing surfaces by masking and etching. Additional layers of conductive materials may be used to provide a barrier layer and a noble metal cap for the conductive elements. The methods of the present invention may be used to fabricate an interposer for use in packaging semiconductor devices or a test substrate. Substrate precursor structures are also disclosed.
申请公布号 US2008060193(A1) 申请公布日期 2008.03.13
申请号 US20070941358 申请日期 2007.11.16
申请人 MICRON TECHNOLOGY, INC. 发明人 FARNWORTH WARREN M.;MCDONALD STEVEN M.;SINHA NISHANT;HIATT WILLIAM M.
分类号 H05K3/06;H01L21/48;H01L23/14;H01L23/15;H01L23/498;H05K3/02;H05K3/10;H05K3/24;H05K3/42 主分类号 H05K3/06
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