发明名称 Power gating schemes in SOI circuits in hybrid SOI-epitaxial CMOS structures
摘要 Disclosed are a multi-threshold CMOS circuit and a method of designing such a circuit. The preferred embodiment combines an MTCMOS scheme and a hybrid SOI-epitaxial CMOS structure. Generally, the logic transistors (both nFET and pFET) are placed in SOI, preferably in a high-performance, high density UTSOI; while the headers or footers are made of bulk epitaxial CMOS devices, with or without an adaptive well-biasing scheme. The logic transistors are based on (100) SOI devices or super HOT, the header devices are in bulk (100) or (110) pFETs with or without an adaptive well biasing scheme, and the footer devices are in bulk (100) NFET with or without an adaptive well biasing scheme.
申请公布号 US7342287(B2) 申请公布日期 2008.03.11
申请号 US20050184244 申请日期 2005.07.19
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 CHUANG CHING-TE;DAS KOUSHIK K.;LO SHIH-HSIEN;SLEIGHT JEFFREY W.
分类号 H01L27/092 主分类号 H01L27/092
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