发明名称 DEPOSITION SOURCE
摘要 A deposition source is provided to uniformly generate vapor of a deposition material and prevent waste of the deposition material by constructing the deposition source in such a structure that can uniformly supply heat to the entire deposition material. A deposition source includes: a deposition cell(100) having a cell cap mounted on an upper end thereof; and a heating unit installed on an outer portion of the deposition cell, wherein the deposition cell includes a bottom member(102) and an outer wall member(101) that form an inner space, and inner wall members(103) that extend from the outer wall member to divide the inner space into a plurality of unit spaces(110). The inner wall members have their ends connected to one another to form the unit spaces as independent spaces. The inner wall members extend radially such that the unit spaces are disposed radially. The inner wall members have their ends spaced from one another such that the unit spaces are connected to one another. The inner wall members have their heights lower than height of the outer wall member.
申请公布号 KR100809930(B1) 申请公布日期 2008.03.06
申请号 KR20060120867 申请日期 2006.12.01
申请人 LG.PHILIPS LCD CO., LTD. 发明人 HEO, JEONG HAENG
分类号 C23C14/24;C23C14/12 主分类号 C23C14/24
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