发明名称 BURIED SEMICONDUCTOR LASER
摘要 PROBLEM TO BE SOLVED: To reduce leakage current of buried semiconductor laser and improve current light output characteristics. SOLUTION: The buried semiconductor laser 1 is formed of a p-type InP substrate 2 and has a ridge 6 consisting of a first clad layer 3 made of p-type InP, an AlGaInAs distortion quantum well active layer 4 and a second clad layer 5 made of n-type InP which are laminated. A buried current block layer 10 in which a first buried layer 7 made of p-type InP, a second buried layer 8 made of n-type InP and a third buried layer 9 made of semi-insulated Fe-doped InP are sequentially laminated is formed on both sides of the ridge 6. The upper surface of the third buried layer 9 is covered with a semiconductor layer 11 made of n-type InP. This structure can prevent a leakage current path from occurring on the upper surface of the third buried layer 9 and improve the reliability of the buried semiconductor laser. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008053649(A) 申请公布日期 2008.03.06
申请号 JP20060231125 申请日期 2006.08.28
申请人 MITSUBISHI ELECTRIC CORP 发明人 TAKIGUCHI TORU;WATAYA TSUTOMU
分类号 H01S5/227 主分类号 H01S5/227
代理机构 代理人
主权项
地址