| 摘要 |
PROBLEM TO BE SOLVED: To prevent film deposition on the part other than the prescribed position in a wafer upon film deposition. SOLUTION: The CVD system comprises: a sample stand (10) to be mounted with a wafer (4) upon film deposition; and an inert gas introduction device (7). The inert gas introduction device (7) introduces an inert gas (22) for removing a gas (21) remaining in a hole (12) provided at the sample stand (10) into the hole (12) upon precoating before the film deposition. COPYRIGHT: (C)2008,JPO&INPIT
|
