| 摘要 |
<p>A chemically amplified positive resist composition is provided to realize excellent sensitivity, resolution and coatability, to improve a pattern profile even under a thickness condition in which standing waves or reverse tapered portions appear. A chemically amplified positive resist composition comprises: at least one resin selected from the compounds represented by the following formulae 1-4; and a photoacid generator represented by the following formula 5. In formula 1, R1 is H or CH3; R2 is a C1-C10 linear, branched or cyclic alkyl; and a and b represent molar fractions of hydroxystyrene units and (meth)acrylate units, respectively, wherein a + b = 1, 0.50<=(a)/(a + b)<=0.90 or 0.1<=(b)/(a + b)<=0.50. In formula 2, R2 is H, methyl, ethyl, propyl, Br, Cl, F or NO2; and c and d represent molar fractions of the corresponding units, wherein c + d = 1, 0.50<=(c)/(c + d)<=0.90 or 0.1<=(d)/(c + d)<=0.50. In formula 3, R3 is H, methyl, ethyl, propyl, Br, Cl, F or NO2; and e and f represent molar fractions of the corresponding units, wherein e + f = 1, 0.50<=(e)/(e + f)<=0.90 or 0.1<=(f)/(e + f)<=0.50. In formula 4, R3 is H, methyl, ethyl, propyl, Br, Cl, F or NO2; and g and h each represent molar fractions of the corresponding units, wherein g + h = 1, 0.50<=(g)/(g + h)<=0.90 or 0.1<=(g)/(g + h)<=0.50. In formula 5, each of R4 and R5 is hydroxyl-, amino- or a C1-C6 alkoxy-substituted or non-substituted C3-C8 linear alkyl; hydroxyl-, amino- or a C1-C6 alkoxy-substituted or non-substituted C3-C8 branched alkyl; hydroxyl-, amino- or a C1-C6 alkoxy-substituted or non-substituted C3-C8 cyclic alkyl; or alkyl- or alkoxy-substituted C6-C10 aryl.</p> |
