METHOD FOR PRODUCING POLYMER, POLYMER AND RESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide a polymer exhibiting designed performance in the objective use, a method for producing the polymer and a resist composition capable of giving a resist film exhibiting the designed performance and suppressing the generation of defects in a resist pattern.

SOLUTION: The polymer is produced by a production method including a step to polymerize a monomer component by a solution polymerization method to obtain a polymer solution and a step to cool the polymer solution with a cooling means (jacket 26) to ≤40°C.

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