MINUTE PATTERN REVISION METHOD

摘要

A method for revising a defect of minute pattern is provided to promptly and accurately correct the defect of minute pattern and to prevent the extension of a defect region by using a mask having a laser passing hole. A mask(50) having a laser passing hole(51) is arranged over minute patterns(30,30'). The laser passing hole is opened so as to be corresponded to minute pattern forming regions(21,21'). A laser is irradiated to the laser passing hole corresponding to a defect minute pattern to remove it. A normal minute pattern is formed on the minute pattern forming region from which the defect minute pattern is removed by filling a minute pattern material into the minute pattern forming regions and hardening the minute pattern material filled in the minute pattern forming regions. The minute patterns are formed in a certain linear arrangement structure along a plane surface of a substrate.