| 摘要 |
A vaporizer and a semiconductor processing system are provided to stabilize a vaporizing process by improving a structure thereof. A vaporizing receptacle is formed to define a vaporizing space of a vaporizer. An injector is installed in the vaporizing receptacle in order to inject a liquid material of a mist type into the vaporizing space of the vaporizer. A heater(130) is installed at the vaporizing receptacle in order to heat the liquid material of the mist type. A gas drawing path is connected to the vaporizing receptacle in order to draw gas obtained from the liquid material from the vaporizing space. A filter is formed to capture the mist of the generated gas within the gas drawing path or between the gas drawing path and the vaporizing space. An infrared irradiator is installed at the filter.
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