| 摘要 |
A load port apparatus is provided to increase the operation rate of a manufacturing apparatus and to improve the efficiency of a wafer treatment process and productivity of wafers by forming a buffer stage just under a table. A wafer carrier(30) for receiving a wafer is temporarily stored in a stock yard. A mounting plate(1) is fixed on a wall arranged between the stock yard and a process treatment apparatus for processing the wafer. A wafer transfer window(2) is installed on the wall. A carrier stage(C) includes a table and a carrier plate(11). The table is horizontally extended from an edge of a lower end of the wafer transfer window. The carrier plate is arranged on the table to support the wafer carrier. The carrier plate is operated to transfer the wafer carrier for the process treatment apparatus. A buffer stage(B) includes a buffer plate(21). The buffer plate is horizontally arranged beneath the table to temporarily store the wafer carrier.
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