发明名称 Method of making a metal oxide film, laminates and electronic devices
摘要 An object is to provide a method of making a metal oxide film with a sufficiently high degree of crystal orientation, without difficulties, at low cost, and with little damage to a base material and the metal oxide film, and to provide laminates and electronic devices using the same. A method includes a step of forming a metal film having a (111) plane, on a base material; a step of forming a metal oxide film on the (111) plane of the metal film; and a step of maintaining a temperature of the metal oxide film formed on the (111) plane of the metal film, at 25-600° C. and irradiating the metal oxide film with UV light.
申请公布号 US2008044673(A1) 申请公布日期 2008.02.21
申请号 US20070812506 申请日期 2007.06.19
申请人 TDK CORPORATION;NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCEAND TECHNOLOGY 发明人 MIYAMOTO YUKI;TSUCHIYA TETSUO
分类号 B32B15/04;B05D3/02 主分类号 B32B15/04
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