| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a method by which the generation of cracks in a sintered compact or a graphite mold can be suppressed when powder containing an oxide of a system, obtained by adding silicon oxide or tungsten oxide to niobium oxide, or the like is subjected to hot press sintering using the graphite mold in order to obtain a sputtering target for forming a dielectric film. <P>SOLUTION: In a method for producing a sintered compact by subjecting powder containing an oxide having a low coefficient of thermal expansion to hot press sintering using the graphite mold, a gap is provided between a split mold 2 and an outer mold 3 each being graphite mold, then fullerene 5 is filled in the gap, and the fullerene 5 is heated and kept in a vacuum atmosphere to evaporate and eliminate the fullerene 5. Thereafter, the hot press sintering is carried out. <P>COPYRIGHT: (C)2008,JPO&INPIT |
