发明名称 METHOD FOR PRODUCING SOLUTION, POLYMER SOLUTION AND RESIST COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide a method for producing a solution having a concentration with a slight deviation from the target concentration in a method for producing a solution, which has a process for concentrating the solution to a target concentration, to obtain a polymer solution exhibiting performance as shown by a design in an objective use and a resist composition making a resist film exhibit performance as shown by a design. SOLUTION: In the method for producing a solution, having a process for concentrating a solution to a target concentration, the concentration is carried out until the refractive index of the solution reaches the refractive index of a solution in the target concentration measured in advance±0.1. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008038034(A) 申请公布日期 2008.02.21
申请号 JP20060214847 申请日期 2006.08.07
申请人 MITSUBISHI RAYON CO LTD 发明人 IZEKI TAKAYUKI;INABA HIDEYUKI
分类号 C08J3/11;G03F7/26 主分类号 C08J3/11
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