| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a plasma processing device capable of efficiently carrying out a treatment by discharge plasma as well as a processing by ultrasonic cleansing or the like. <P>SOLUTION: The plasma processing device 11 includes a container 12 capable of introducing cleaning water W, an ultrasonic generation device 13, a microwave generation device 14, and a pressure reduction device 15. The ultrasonic generation device 13 frequently generates cavitations by irradiating ultrasonic wave into the cleaning water W inside the container 12, and transfers toxic substances contained in the cleaning water W from liquid phase to gas phase. The microwave generation device 14 generates discharge plasma in the gas phase by irradiating microwave to the gas phase inside the container 12, and the vaporized toxic substances are decomposed and made harmless by the discharge plasma. <P>COPYRIGHT: (C)2008,JPO&INPIT |
