METHODS AND APPARATUS FOR DEPOSITING A MICROCRYSTALLINE SILICON FILM FOR PHOTOVOLTAIC DEVICE
摘要
Methods for depositing a microcrystalline silicon film layer with improved deposition rate and film quality are provided in the present invention. Also, a photovoltaic (PV) cell having a microcrystalline silicon film is provided. In one embodiment, the method produces a microcrystalline silicon film on a substrate at a deposition rate greater than about 20 nm per minute, wherein the microcrystalline silicon film has a crystallized volume between about 20 percent to about 80 percent.
申请公布号
WO2007149945(A3)
申请公布日期
2008.02.21
申请号
WO2007US71703
申请日期
2007.06.20
申请人
APPLIED MATERIALS, INC.;CHOI, SOO YOUNG;TAKEHARA, TAKAKO;WHITE, JOHN M.;CHAE, YONG KEE
发明人
CHOI, SOO YOUNG;TAKEHARA, TAKAKO;WHITE, JOHN M.;CHAE, YONG KEE