发明名称 METHODS AND APPARATUS FOR DEPOSITING A MICROCRYSTALLINE SILICON FILM FOR PHOTOVOLTAIC DEVICE
摘要 Methods for depositing a microcrystalline silicon film layer with improved deposition rate and film quality are provided in the present invention. Also, a photovoltaic (PV) cell having a microcrystalline silicon film is provided. In one embodiment, the method produces a microcrystalline silicon film on a substrate at a deposition rate greater than about 20 nm per minute, wherein the microcrystalline silicon film has a crystallized volume between about 20 percent to about 80 percent.
申请公布号 WO2007149945(A3) 申请公布日期 2008.02.21
申请号 WO2007US71703 申请日期 2007.06.20
申请人 APPLIED MATERIALS, INC.;CHOI, SOO YOUNG;TAKEHARA, TAKAKO;WHITE, JOHN M.;CHAE, YONG KEE 发明人 CHOI, SOO YOUNG;TAKEHARA, TAKAKO;WHITE, JOHN M.;CHAE, YONG KEE
分类号 H01L31/00 主分类号 H01L31/00
代理机构 代理人
主权项
地址