发明名称 UNIT AND SYSTEM FOR GAS TREATMENT
摘要 <P>PROBLEM TO BE SOLVED: To enable removal of target ingredients in a treatment target gas to a sufficiently low concentration of the ingredients even when the concentration of the ingredients changes rapidly. <P>SOLUTION: There is provided at least two wet exhaust gas treatment units 10 each in which a water spraying column 16 spraying a removing solution into an exhaust gas GA to remove target ingredients from the exhaust gas GA is arranged in the body 11 of equipment; target ingredients are romoved from the exhaust gas GA introduced from an exhaust gas introduction tube 12 arranged in the body 11 of equipment by the water spraying column 16; and the exhaust gas is discharged from an exhaust gas discharge tube 13 arranged in the body 11 of the equipment. The exhaust gas discharge tube 13 of one of the units 10 and the exhaust gas introduction tube 12 of the other of the units 10 are connected with each other through a connection tube 15 so as to connect the units 10 in series. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008036513(A) 申请公布日期 2008.02.21
申请号 JP20060212946 申请日期 2006.08.04
申请人 IWASAKI ELECTRIC CO LTD 发明人 YOSHINO KIYOSHI
分类号 B01D53/44;B01D53/38;B01D53/70;B01D53/75;B01D53/77;B01D53/86;B01J35/02 主分类号 B01D53/44
代理机构 代理人
主权项
地址