| 摘要 |
PROBLEM TO BE SOLVED: To provide a patterning method for forming a predetermined resist pattern uniformly and stably even on a substrate having a hydrophobic surface because of immersion exposure, and to provide a patterning device for use therein. SOLUTION: Before a resist pattern is formed by applying developer, chemical is supplied onto the surface of a substrate where a resist film is exposed to a predetermined pattern by immersion exposure, thus rendering the substrate surface hydrophilic by such a degree as the entire surface is wetted with the developer. COPYRIGHT: (C)2008,JPO&INPIT |
