| 摘要 |
[Subject In a plasma process using an ammonia gas after conducting a plasma process by using a process gas containing fluorine and carbon to a silicone-containing substrate, an ammonium silicofluoride having toxicity and water absorbancy is formed on the substrate. [Means for Solution]After conducting the plasma process using an ammonia gas, the substrate is heated to a temperature not lower than the decomposition temperature of the ammonium silicofluoride to decompose the ammonium silicofluoride in a process container in which the plasma process was conducted, or in a process container connected with the processing vessel which the plasma process was conducted therein and is isolated from a clean room atmosphere.
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