发明名称 GAS SAVER FOR SEMICONDUCTOR MANUFACTURING
摘要 A gas saver for manufacturing a semiconductor is provided to control an operation of the gas saver in dual mode and a supply of process gas according to a semiconductor manufacturing process by using a pressure detection and a voltage detection. A micro processor(10) controls a system. A user inputs/outputs data to the micro processor with a user interface(11). A system interface(12) inputs/outputs data for controlling the system to the micro processor. A timer(13) extends supplying of nitrogen gas during a specific time. The timer supplies the nitrogen gas and exhausts the remaining gas impurities to the outside. A valve control unit 1(14) controls a valve 1(21). A valve control unit 2(15) controls a valve 2(22). An inverter(16) inverts a signal outputted from the valve control unit 1 to transmit it to the valve 1. An output signal comparing unit(17) compares operations between the valve 1 and the value detected in a nitrogen gas detecting sensor unit. An input signal comparing unit(18) compares a pressure signal with a voltage signal transmitted from a pressure detecting unit(19) and a voltage detecting unit(20). The pressure detecting unit receives two pressure signals to transmit them to the input signal comparing units. The voltage detecting unit receives two voltage signals to transmit them to the input signal comparing unit. The nitrogen gas detecting sensor unit(23) detects nitrogen gas supplied to a vacuum pump from the valve 1.
申请公布号 KR20080015753(A) 申请公布日期 2008.02.20
申请号 KR20070082150 申请日期 2007.08.16
申请人 PARK, JONG HA 发明人 PARK, JONG HA
分类号 H01L21/02;H01L21/00 主分类号 H01L21/02
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