发明名称 |
Polymerizable compound, polymer, positive-resist composition, and patterning process using the same |
摘要 |
The present invention provides a polymer which has at least one or more of a repeating unit represented by a following general formula (1a), a repeating unit represented by a following general formula (2a) and a repeating unit represented by a following general formula (3b), and a repeating unit represented by a following general formula (1c), and a positive resist composition which contains as a base resin the polymer. Thereby, there can be provided a positive-resist composition having high sensitivity and high resolution in exposure with a high energy beam, wherein line edge roughness is small since swelling at the time of development is suppressed, and the residue after development is few.
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申请公布号 |
US7332616(B2) |
申请公布日期 |
2008.02.19 |
申请号 |
US20070672917 |
申请日期 |
2007.02.08 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD. |
发明人 |
HATAKEYAMA JUN;HARADA YUJI;KAWAI YOSHIO |
分类号 |
C07D333/64;C07C43/18;C07C67/02;C07C69/52;C07C69/54;C07D307/00;C07D333/72;C07D409/02;C08F220/18;C08F220/28;G03C1/76;G03F7/004;G03F7/039 |
主分类号 |
C07D333/64 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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