发明名称 |
METHOD AND APPARATUS FOR MONITORING AND CONTROL OF SUCK BACK LEVEL IN A PHOTORESIST DISPENSE SYSTEM |
摘要 |
An apparatus for monitoring a position of a semiconductor process fluid interface in a dispense nozzle includes an extended optical source adapted to provide an optical beam propagating along an optical path. The optical beam is characterized by a path width measured in a first direction aligned with a dispense direction. The apparatus also includes an optical detector coupled to the optical path and adapted to detect at least a portion of the optical beam and a dispense nozzle disposed along the optical path at a location between the extended optical source and the optical detector. The apparatus further includes a nozzle positioning member coupled to the dispense nozzle and adapted to translate the dispense nozzle in the first direction.
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申请公布号 |
US2008035666(A1) |
申请公布日期 |
2008.02.14 |
申请号 |
US20070691468 |
申请日期 |
2007.03.26 |
申请人 |
SOKUDO CO., LTD. |
发明人 |
PORRAS ERICA R.;RAMANAN NATARAJAN |
分类号 |
B67D7/08;G01B11/14 |
主分类号 |
B67D7/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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