| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive photosensitive composition capable of giving a patterned film excellent in pattern profile because the photosensitive composition in an exposed portion can be thoroughly dissolved in a developer, a method for producing a patterned film using the same and a semiconductor device. <P>SOLUTION: The positive photosensitive composition comprises a condensate (A) of an alkoxysilane having an SiOH group, a thermal acid generator (B), a photo-cation generator (C) and at least one compound (D) selected from a monofunctional epoxy compound, a monofunctional vinyl ether and a monofunctional oxetane compound. The method for producing a patterned film 1C using the same and the semiconductor device are also provided. <P>COPYRIGHT: (C)2008,JPO&INPIT |
