| 摘要 |
PROBLEM TO BE SOLVED: To provide a charged particle beam irradiation method which is effective in observing a semiconductor device which comprises a variety of micro hole patterns. SOLUTION: The charged particle beam irradiation method includes: a step S1 of setting an observation region containing a target pattern to a sample containing the target pattern as a target to be observed; a step S2 of setting an irradiation region which contains the observation region and is wider than the observation region, and on which charged particle beams are irradiated, and of setting a non-irradiation region on which the charged particle beams are not irradiated on the irradiation region; a step 3 of irradiating the charged particle beams on the irradiation region other than the non-irradiation region: and a step 4 of irradiating the charged particle beams on the observation region after the step of irradiating the charged particle beams on the irradiation region. COPYRIGHT: (C)2008,JPO&INPIT
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