发明名称 SEMICONDUCTOR MANUFACTURING EQUIPMENT FOR REMOVING CHEMICAL SMELL
摘要 A semiconductor manufacturing apparatus for removing chemical smell is provided to improve the working environment for a worker by including a suction fan for sucking and exhausting the chemical smell. A semiconductor manufacturing apparatus for removing chemical smell comprises a chemical module part(140), a suction fan(120), an exhaust pipe(124), and a vacuum line(122). The chemical module part treats a process by using at least one chemical. The suction fan is installed in an upper part of the chemical module part, and sucks the chemical smell generated from the chemicals. The exhaust pipe is installed outside the chemical module part. The vacuum line connects the suction fan and the exhaust pipe, and exhausts the chemical smell sucked from the suction fan to the exhaust pipe.
申请公布号 KR20080014245(A) 申请公布日期 2008.02.14
申请号 KR20060075681 申请日期 2006.08.10
申请人 SEMES CO., LTD. 发明人 WON, JONG WOO
分类号 H01L21/304 主分类号 H01L21/304
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