发明名称 COMPOSITE METAL LAYER FORMED USING METAL NANOCRYSTALLINE PARTICLES IN AN ELECTROPLATING BATH
摘要 <p>A method for forming a composite metal layer on a substrate comprises providing nanocrystalline particles of a first metal, adding the nanocrystalline particles to a plating bath that contains ions of a second metal to form a colloid-like suspension, immersing the substrate in the plating bath, and causing a co-deposition of the second metal and the nanocrystalline particles of the first metal on the substrate to form the composite metal layer. The co-deposition may be caused by inducing a negative bias on the substrate and applying an electric current to the plating bath to induce an electroplating process. In the electroplating process, the ions of the second metal are reduced by the substrate and become co-deposited on the substrate with the nanocrystalline particles of the first metal to form the composite metal layer.</p>
申请公布号 KR20080014079(A) 申请公布日期 2008.02.13
申请号 KR20077030336 申请日期 2007.12.26
申请人 INTEL CORP. 发明人 WORWAG WOJCIECH;MUTHUKUMAR SRIRAM
分类号 C25D15/02;C25D7/12;H01L21/768;H05K3/42 主分类号 C25D15/02
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