发明名称 GAS DISCHARGE SOURCE, IN PARTICULAR FOR EUV RADIATION
摘要 <p>A gas discharge source for EUV radiation and/or soft X-ray radiation is arranged in a vacuum chamber and includes at least two electrodes, each with a circular periphery and rotatably mounted for rotation. At one spatial position, the electrodes have a small spacing for the ignition of a gas discharge and are each connected to a reservoir for a liquid, electrically conductive material. During rotation, a liquid film of the electrically conductive material forms over the circular periphery of the electrodes and a flow of current to the electrodes is made possible. The electrodes connect to the reservoirs via a respective connecting element, wherein a gap is formed between electrode and connecting element over a partial section of the circular periphery of each electrode. The liquid material can penetrate from the reservoir and into the gap during rotation of the electrode via a feed channel formed in the connecting element.</p>
申请公布号 EP1886542(A2) 申请公布日期 2008.02.13
申请号 EP20060744876 申请日期 2006.05.08
申请人 PHILIPS INTELLECTUAL PROPERTY & STANDARDS GMBH;KONINKLIJKE PHILIPS ELECTRONICS N.V. 发明人 NEFF, JAKOB WILLI;PRUEMMER, RALF
分类号 H05G2/00 主分类号 H05G2/00
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