发明名称 |
GAS DISCHARGE SOURCE, IN PARTICULAR FOR EUV RADIATION |
摘要 |
<p>A gas discharge source for EUV radiation and/or soft X-ray radiation is arranged in a vacuum chamber and includes at least two electrodes, each with a circular periphery and rotatably mounted for rotation. At one spatial position, the electrodes have a small spacing for the ignition of a gas discharge and are each connected to a reservoir for a liquid, electrically conductive material. During rotation, a liquid film of the electrically conductive material forms over the circular periphery of the electrodes and a flow of current to the electrodes is made possible. The electrodes connect to the reservoirs via a respective connecting element, wherein a gap is formed between electrode and connecting element over a partial section of the circular periphery of each electrode. The liquid material can penetrate from the reservoir and into the gap during rotation of the electrode via a feed channel formed in the connecting element.</p> |
申请公布号 |
EP1886542(A2) |
申请公布日期 |
2008.02.13 |
申请号 |
EP20060744876 |
申请日期 |
2006.05.08 |
申请人 |
PHILIPS INTELLECTUAL PROPERTY & STANDARDS GMBH;KONINKLIJKE PHILIPS ELECTRONICS N.V. |
发明人 |
NEFF, JAKOB WILLI;PRUEMMER, RALF |
分类号 |
H05G2/00 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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