METHOD OF DRYING SUBSTRATE, AND APPARATUS FOR PERFORMING THE SAME

摘要

A substrate drying method is provided to restrain generation of a water mark by sufficiently removing water remaining on a substrate. A substrate cleaned by using a cleaning solution containing deionized water is firstly rinsed by using a dry agent containing a first organic fluorine-based compound and alcohol(S10). The firstly rinsed substrate is secondly rinsed by using an organic fluorine-based compound solvent containing a second organic fluorine-based compound(S20). The organic fluorine-based compound solvent is a solvent from which water is removed. The alcohol is isopropyl alcohol, ethanol or methanol.