CLEANING APPARATUS OF EXHAUST GAS FOR PROCESSING BY-PRODUCTS GENERATED DURING THE DECOMPOSITION OF PERFLUOROCOMPOUND AND METHOD THEREOF

摘要

An apparatus and a method are provided to remove contaminants contained in flue gas generated in a semiconductor or LCD manufacturing process by connecting a reactive agent part having a reactive agent layer for purifying flue gas comprising by-products generated during removing of the flue gas to a rear part of a flue gas removing equipment for removing flue gas comprising perfluorocompounds. An apparatus for removing flue gas generated in the semiconductor manufacturing process comprises the followings: a flue gas inlet(2) into which flue gas flows; an air injection port(32) connected to the flue gas inlet to supply air to the flue gas inlet; an adsorption reaction part(4) including an adsorption layer(14) connected to the flue gas inlet to adsorb the flue gas flowing into the flue gas inlet; a catalytic reaction part(6) including a catalyst layer(18) which is connected to the adsorption reaction part, and in which flue gas exhausted from the adsorption reaction part is catalytically treated; a water injection port(26) connected to a moving path of flue gas flown into the catalytic reaction part to supply water; a reactive agent part(9) including a reactive agent layer(19) which is connected to the catalytic reaction part, and in which by-product contained flue gas exhausted from the catalytic reaction part is purified; and a flue gas outlet(24) which is connected to the reactive agent part, and exhausts flue gas.