COMPOSITION FOR PHOTOSENSITIVE ORGANIC INSULATING LAYER AND THE ORGANIC INSULATING LAYER MANUFACTURED BY USING THE SAME

摘要

A composition of a photosensitive organic insulation layer is provided to be widely used in an organic insulation layer for a liquid display device for display and h-, g-, i-line photoresist by remarkably improving adhesion between substrates. A composition of a photosensitive organic insulation layer(11) contains a photosensitive material, alkaline soluble resin, a solvent and a poly hydroxy styrene-based compound designated by the following chemical wherein m and n are independently and respectively 1, 2 or 3. The photosensitive material is a compound having a quinone diazide radical.